DEPOSITION OF INDIUM-ANTIMONIDE FILMS BY METALORGANIC MAGNETRON SPUTTERING

被引：23

作者：

WEBB, JB

HALPIN, C

机构：

来源：

APPLIED PHYSICS LETTERS | 1985年 / 47卷 / 08期

关键词：

D O I：

10.1063/1.95999

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

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页码：831 / 833

页数：3

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