KINETICS AND MECHANISM OF THE GAS-PHASE PYROLYSIS OF HEXAFLUORODISILANE IN THE PRESENCE OF IODINE AND SOME REACTIONS OF SILICON DIFLUORIDE

被引：23

作者：

BAINS, SK

NOBLE, PN

WALSH, R

机构：

[1] UNIV READING,DEPT CHEM,POB 224,READING RG6 2AD,BERKS,ENGLAND

[2] CALIF STATE UNIV SACRAMENTO,DEPT CHEM,SACRAMENTO,CA 95819

来源：

JOURNAL OF THE CHEMICAL SOCIETY-FARADAY TRANSACTIONS II | 1986年 / 82卷

关键词：

D O I：

10.1039/f29868200837

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

引用

页码：837 / 847

页数：11

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