EFFECT OF PARTIAL-PRESSURE OF THE REACTANT GAS ON THE CHEMICAL VAPOR-DEPOSITION OF AL2O3

被引：38

作者：

KIM, JG

PARK, CS

CHUN, JS

机构：

来源：

关键词：

D O I：

10.1016/0040-6090(82)90421-7

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：97 / 106

页数：10

共 13 条

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