PHOTODOPING OF AG IN AG-AS-S GLASSES

被引：17

作者：

TANAKA, K

机构：

[1] Department of Applied Physics, Faculty of Engineering, Hokkaido University, Sapporo

来源：

JOURNAL OF NON-CRYSTALLINE SOLIDS | 1994年 / 170卷 / 01期

关键词：

D O I：

10.1016/0022-3093(94)90099-X

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

The photodoping rate of Ag in As-S and Ag-As-S bulk glasses has been studied as a function of composition. The rate is evaluated from the resistance change of Ag layers. In the Ag:AsxS100-x system, the rate shows a maximum at x congruent-to 30. In the Ag:(Ag2S)x(As2S3)1-x system, with an increase in the Ag content, the rate increases first, then decreases, and it becomes approximately zero in the glass containing greater than or similar to 25 at.% Ag. These results are compared with thermal diffusion phenomena and are discussed in the light of the Owen's idea for photodoping.

引用

页码：27 / 31

页数：5

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