CHARACTERIZATION OF P-TYPE SILICON FIELD EMITTERS

被引:16
作者
SAWADA, K
JI, K
ANDO, T
机构
[1] Research Institute of Electronics, Shizuoka University, Hamamatsu, 43
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS | 1994年 / 33卷 / 9B期
关键词
VACUUM MICROELECTRONICS; FIELD EMITTER; SURFACE STATE DENSITY; P-TYPE SILICON; ELECTRON GENERATION RATE;
D O I
10.1143/JJAP.33.L1345
中图分类号
O59 [应用物理学];
学科分类号
摘要
The saturation current phenomenon of a p-type silicon field emitter is reported and the mechanism of this phenomenon is proposed. The current-voltage characteristics of these field emitters using n-type silicon follow the Fowler-Nordheim relationship. However, the emission current of the emitters using p-type silicon is saturated in a high field region, because maximum emission electrons are restricted by the electron generation rate at the surface. The saturation current is observed on the emitters with HF treatment, but it not without HF treatment. These results indicate that the saturation current depends on the surface state density.
引用
收藏
页码:L1345 / L1347
页数:3
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