ROTATIONAL TEMPERATURE IN HELIUM, ARGON, AND OXYGEN MICROWAVE-INDUCED PLASMAS - COMPARISON WITH TRANSLATIONAL AND SOLID-SURFACE TEMPERATURES

被引：19

作者：

ALANDARI, J ^{[1
]}

DIAMY, AM ^{[1
]}

GUILLERME, JM ^{[1
]}

LEGRAND, JC ^{[1
]}

BENAIM, RI ^{[1
]}

机构：

[1] UNIV PIERRE & MARIE CURIE,CNRS,UA 40870,CHIM GEN LAB,4 PL JUSSIEU,TOUR 55,F-75252 PARIS 05,FRANCE

来源：

APPLIED SPECTROSCOPY | 1989年 / 43卷 / 04期

关键词：

D O I：

10.1366/0003702894202490

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

引用

页码：681 / 687

页数：7

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