HOLOGRAPHIC CHARACTERISTICS OF 10E75 PLATES FOR SINGLE-EXPOSURE AND MULTIPLE-EXPOSURE HOLOGRAMS

被引：10

作者：

LANDRY, MJ ^{[1
]}

PHIPPS, GS ^{[1
]}

机构：

[1] SANDIA LABS,ALBUQUERQUE,NM 87115

来源：

APPLIED OPTICS | 1975年 / 14卷 / 09期

关键词：

D O I：

10.1364/AO.14.002260

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

引用

页码：2260 / 2266

页数：7

共 30 条

[1]

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[2]

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[4]

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[5] ATTEMPTS TO INCREASE HOLOGRAPHIC EXPOSURE INDEX OF PHOTOGRAPHIC MATERIALS [J].

BIEDERMANN, K .

APPLIED OPTICS, 1971, 10 (03) :584-+

[6]

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[7] NONLINEAR EFFECTS IN HOLOGRAPHY [J].

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LOHMANN, A .

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[8]

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[9] RESOLUTION IN HOLOGRAPHY [J].

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MASSEY, NG .

APPLIED OPTICS, 1969, 8 (09) :1879-&

[10] EFFECTS OF FILM NONLINEARITIES IN HOLOGRAPHY [J].

FRIESEM, AA ;

ZELENKA, JS .

APPLIED OPTICS, 1967, 6 (10) :1755-&

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