SPUTTERED FILMS OF NICKEL AND NICKEL-OXIDE

被引:9
作者
MATSUEDA, H [1 ]
AVERBACH, BL [1 ]
机构
[1] MIT,CAMBRIDGE,MA 02139
来源
MATERIALS SCIENCE AND ENGINEERING | 1976年 / 23卷 / 2-3期
关键词
D O I
10.1016/0025-5416(76)90181-6
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
引用
收藏
页码:131 / 134
页数:4
相关论文
共 6 条
[1]  
Chopra K.L, 1969, THIN FILM PHENOMENA
[2]   SCANNING ELECTRON DIFFRACTION ATTACHMENT WITH ELECTRON ENERGY FILTERING [J].
GRACZYK, JF ;
MOSS, SC .
REVIEW OF SCIENTIFIC INSTRUMENTS, 1969, 40 (03) :424-&
[3]  
HEMMINGER P, 1965, ACTA CRYSTALLOGR, V19, P690
[4]  
HOLLAND L., 1970, VACUUM DEPOSITION TH, P1600
[5]  
NEUGEBAUER CA, 1959, P INT C STRUCTURE PR
[6]   EFFECT OF STRUCTURE ON X-RAY PHOTOELECTRON-SPECTRA OF NICKEL OXIDES [J].
RECHTIN, MD ;
AVERBACH, BL .
JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS, 1975, 36 (09) :893-897