SYNTHESIS OF POLY(2-CYCLOHEXENONE-4-YL METHACRYLATE) AND ACIDOLYSIS OF PENDANT PROTECTING GROUPS IN THE POLYMER

4-Acetoxy-2-cyclohexenone (ACH) and 2-cyclohexenone-4-yl methacrylate (CHM) were obtained from the condensation reaction of 4-bromo-2-cyclohexenone (BCH) with acetic acid and methacrylic acid using 1,8-diazabicyclo-[5,4,0]-7-undecene (DBU), respectively. Poly(2-cyclohexenone-4-yl methacrylate) (P-1) containing acid-sensitive 2-cyclohexenone-4-yl group was prepared from the radical polymerization of CHM and the esterification of poly(methacrylic acid) with BCH using DBU. Furthermore, P-1 and CHM copolymers (P-2 and P-3) were easily synthesized from the radical polymerization of methacrylic acid and comonomers in dimethylsulfoxide using 1 mol % of 2,2'-azobis (isobutyronitrile) followed by esterification of the resulting polymers with BCH using DBU by one-pot method. The deprotection reaction of ACH and P-1 was carried out in dichloromethane using an acid catalyst. The reaction proceeded smoothly in solution to give phenol and the corresponding carboxylic acid. Therefore, the 2-cyclohexenone-4-yl group is a useful protecting group for carboxylic acids, because the protection and deprotection reactions are very easy. In the case of polymer films, however, the acid was trapped by carbonyl group on the 2-cyclohexenone-4-yl group, and did not cause the deprotection reaction.