In situ pulsed excimer laser processing of high Tc YBa 2Cu3O7-δ films on Si (100) substrates with yttria-stabilized zirconia (YSZ) buffer layers, has been carried out for the first time using a multitarget deposition system. Both YSZ and YBa2Cu3O7-δ layers were deposited sequentially using a KrF excimer laser (λ=248 nm) at substrate temperature of 650°C. The morphology and structure of the buffer layers and YBa2Cu3O7-δ films were determined using x-ray diffraction and transmission electron microscopy techniques. The superconducting transition temperature Tc (onset) of 90 K and Tc0 (zero resistance) of 82 K were achieved for YBa 2Cu3O7-δ thin films on Si with YSZ buffer layers. An interesting result of this study was that good quality, highly textured YBa2Cu3O7-δ films with the c axis perpendicular to the substrate could be grown on single crystal as well as polycrystalline textured YSZ layers deposited on silicon substrates.
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FURUKAWA ELECTRON CO LTD,YOKOHAMA RES & DEV LABS,NISHI KU,YOKOHAMA 220,JAPANFURUKAWA ELECTRON CO LTD,YOKOHAMA RES & DEV LABS,NISHI KU,YOKOHAMA 220,JAPAN
KUMAKURA, H
TOGANO, K
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FURUKAWA ELECTRON CO LTD,YOKOHAMA RES & DEV LABS,NISHI KU,YOKOHAMA 220,JAPANFURUKAWA ELECTRON CO LTD,YOKOHAMA RES & DEV LABS,NISHI KU,YOKOHAMA 220,JAPAN
TOGANO, K
MAEDA, H
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FURUKAWA ELECTRON CO LTD,YOKOHAMA RES & DEV LABS,NISHI KU,YOKOHAMA 220,JAPANFURUKAWA ELECTRON CO LTD,YOKOHAMA RES & DEV LABS,NISHI KU,YOKOHAMA 220,JAPAN
MAEDA, H
MIMURA, M
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FURUKAWA ELECTRON CO LTD,YOKOHAMA RES & DEV LABS,NISHI KU,YOKOHAMA 220,JAPANFURUKAWA ELECTRON CO LTD,YOKOHAMA RES & DEV LABS,NISHI KU,YOKOHAMA 220,JAPAN
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FURUKAWA ELECTRON CO LTD,YOKOHAMA RES & DEV LABS,NISHI KU,YOKOHAMA 220,JAPANFURUKAWA ELECTRON CO LTD,YOKOHAMA RES & DEV LABS,NISHI KU,YOKOHAMA 220,JAPAN
KUMAKURA, H
TOGANO, K
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FURUKAWA ELECTRON CO LTD,YOKOHAMA RES & DEV LABS,NISHI KU,YOKOHAMA 220,JAPANFURUKAWA ELECTRON CO LTD,YOKOHAMA RES & DEV LABS,NISHI KU,YOKOHAMA 220,JAPAN
TOGANO, K
MAEDA, H
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FURUKAWA ELECTRON CO LTD,YOKOHAMA RES & DEV LABS,NISHI KU,YOKOHAMA 220,JAPANFURUKAWA ELECTRON CO LTD,YOKOHAMA RES & DEV LABS,NISHI KU,YOKOHAMA 220,JAPAN
MAEDA, H
MIMURA, M
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FURUKAWA ELECTRON CO LTD,YOKOHAMA RES & DEV LABS,NISHI KU,YOKOHAMA 220,JAPANFURUKAWA ELECTRON CO LTD,YOKOHAMA RES & DEV LABS,NISHI KU,YOKOHAMA 220,JAPAN