INJECTION-LEVEL-DEPENDENT RECOMBINATION VELOCITIES AT THE SI-SIO2 INTERFACE FOR VARIOUS DOPANT CONCENTRATIONS

被引:98
作者
GLUNZ, SW
SPROUL, AB
WARTA, W
WETTLING, W
机构
[1] Fraunhofer-Institut für Solare Energiesysteme (ISE), D-79100 Freiburg
关键词
D O I
10.1063/1.356399
中图分类号
O59 [应用物理学];
学科分类号
摘要
Measurements of the dependence of the effective surface recombination velocity S-eff at the Si-SiO2 interface on light-induced carrier concentration are presented. Contactless lifetime measurements by modulated free-carrier IR absorption with additional bias light and by photoconductance decay measurements of samples immersed in HF were used to extract S-eff for varying illumination levels. For various dopant concentrations the measured surface recombination velocities are compared with theoretical predictions calculated using an extended Shockley-Read-Hall formalism for Si-SiO2 interfaces. Good agreement was obtained. The consequences for solar cell performance and lifetime measurement techniques are discussed.
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页码:1611 / 1615
页数:5
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