PHOTOLYSIS OF ASYM-N2O4 (ONONO2) ISOLATED IN AN ARGON MATRIX AT 11 K

被引：35

作者：

BANDOW, H ^{[1
]}

AKIMOTO, H ^{[1
]}

AKIYAMA, S ^{[1
]}

TEZUKA, T ^{[1
]}

机构：

[1] UNIV TSUKUBA,DEPT CHEM,SAKURA,IBARAKI 30031,JAPAN

来源：

CHEMICAL PHYSICS LETTERS | 1984年 / 111卷 / 4-5期

关键词：

D O I：

10.1016/0009-2614(84)85547-5

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

页码：496 / 500

页数：5

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