LOW-TEMPERATURE GROWTH OF MGO BY MOLECULAR-BEAM EPITAXY

被引:103
作者
YADAVALLI, S [1 ]
YANG, MH [1 ]
FLYNN, CP [1 ]
机构
[1] UNIV ILLINOIS,MAT RES LAB,URBANA,IL 61801
来源
PHYSICAL REVIEW B | 1990年 / 41卷 / 11期
关键词
D O I
10.1103/PhysRevB.41.7961
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We have explored the epitaxial growth of MgO single crystals using separate O2 and Mg beams and also e-beam-evaporated MgO. The latter method is preferred as the incorporation efficiency of O2 turns out to be 10-3 even at 200°C in the former method. Excellent MgO grows by e-beam evaporation at temperatures down to 140 K (Tm/20), in agreement with expectations of Yang and Flynn. Good surface quality is achieved in heteroepitaxy, even for the first few monolayers. © 1990 The American Physical Society.
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页码:7961 / 7963
页数:3
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