THE SYSTEM FOR DEPOSITING HARD DIAMOND-LIKE FILMS ONTO COMPLEX-SHAPED MACHINE ELEMENTS IN AN RF ARC PLASMA

被引：26

作者：

MITURA, S ^{[1
]}

HAS, Z ^{[1
]}

GOROKHOVSKY, V ^{[1
]}

机构：

[1] KIEV SUPERHARD MAT INST,KIEV 252153,USSR

来源：

SURFACE & COATINGS TECHNOLOGY | 1991年 / 47卷 / 1-3期

关键词：

D O I：

10.1016/0257-8972(91)90273-Y

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

In this paper the influence of additional carbon atom particles on the synthesis of hard carbon films in an r.f. plasma has been discussed. To estimate this, the r.f. plasma was discharged between two electrodes: one in a cylinder form made of graphite and the other formed as a substrate holder. Methane and nitrogen, argon and hydrogen in different ratios was supplied to the reactor chamber through a gas feeder with a microcomputer control. A two-channel r.f. generator was used for plasma excitation. In addition, to obtain a plasma in the pressure range 10(-3)-10(-4) hPa, a gas-ionization-independent source based on the d.c. arc principle was used.

引用

页码：106 / 112

页数：7

共 25 条

[1] ION-BEAM DEPOSITION OF THIN FILMS OF DIAMONDLIKE CARBON [J].