LOW-DOSE EFFECTS IN THE SPUTTERING OF EVAPORATED-FILMS

被引：2

作者：

FLORIO, ARO ^{[1
]}

ALONSO, EV ^{[1
]}

BARAGIOLA, RA ^{[1
]}

FERRON, J ^{[1
]}

机构：

[1] CTR ATOM BARILOCHE,BR-8400 BARILOCHE,ARGENTINA

来源：

RADIATION EFFECTS LETTERS | 1983年 / 76卷 / 04期

关键词：

D O I：

10.1080/01422448308209651

中图分类号：

TL [原子能技术]; O571 [原子核物理学];

学科分类号：

0827 ; 082701 ;

摘要：

引用

页码：137 / 142

页数：6

共 8 条

[1]

ANDERSEN HH, 1981, SPUTTERING PARTICLE, V1, pCH4

[2] DEPENDENCE OF SPUTTERING COEFFICIENT ON ION DOSE [J].

COLLIGON, JS ;

PATEL, MH .

RADIATION EFFECTS AND DEFECTS IN SOLIDS, 1977, 32 (3-4) :193-197

[3] LIGHT ION-BOMBARDMENT SPUTTERING, STRESS BUILDUP, AND ENHANCED SURFACE CONTAMINATION [J].

EERNISSE, EP .

JOURNAL OF NUCLEAR MATERIALS, 1974, 53 (01) :226-230

[4]

EERNISSE EP, 1974, J VAC SCI TECHNOL, V11, P488

[5] DEPENDENCE OF ION-ELECTRON EMISSION FROM CLEAN METALS ON THE INCIDENCE ANGLE OF THE PROJECTILE [J].

FERRON, J ;

ALONSO, EV ;

BARAGIOLA, RA ;

OLIVAFLORIO, A .

PHYSICAL REVIEW B, 1981, 24 (08) :4412-4419

[6]

JACKSON DP, 1983, RAD EFFECTS, V18, P1

[7] ENERGY-DEPENDENCE OF THE MOLECULAR EFFECT IN SPUTTERING [J].

OLIVAFLORIO, AR ;

ALONSO, EV ;

BARAGIOLA, RA ;

FERRON, J ;

JAKAS, MM .

RADIATION EFFECTS LETTERS, 1979, 50 (01) :3-7

[8]

SCHULTZ F, 1973, RAD EFFECTS, V18, P221

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