OES-MEASUREMENTS ON ALUMINUM, COPPER AND LEAD SAMPLES WITH A MICROWAVE-BOOSTED GLOW-DISCHARGE LAMP

被引：29

作者：

LEIS, F ^{[1
]}

BROEKAERT, JAC ^{[1
]}

STEERS, EBM ^{[1
]}

机构：

[1] POLYTECH N LONDON,LONDON N7 8DB,ENGLAND

来源：

SPECTROCHIMICA ACTA PART B-ATOMIC SPECTROSCOPY | 1991年 / 46卷 / 02期

关键词：

D O I：

10.1016/0584-8547(91)80026-Y

中图分类号：

O433 [光谱学];

学科分类号：

0703 ; 070302 ;

摘要：

A microwave-boosted glow discharge lamp with argon as the plasma gas was used for optical emission spectroscopic (OES) measurements on aluminium, copper and lead samples. The shapes of the craters and the sputtering rates were investigated. Line profiles have been recorded for some elements and compared with those of a conventional lamp. For aluminium samples, the influence of a high zinc content on the signal obtained for magnesium was investigated. Background equivalent concentrations for a number of elements in Al, Cu and Pb were calculated and found to be in the range from 1 to 25-mu-g/g for aluminium samples, 0.4 to 110-mu-g/g for copper samples, and 0.4 to 11-mu-g/g for lead samples if the most sensitive spectral line for each element was used. In the case of copper samples the background equivalent concentrations were compared with those found for a conventional glow discharge lamp.

引用

页码：243 / 251

页数：9

共 12 条

[1] SURFACE-ANALYSIS WITH THE GLOW-DISCHARGE LAMP - STATE OF THE ART AND PROSPECTS FOR FUTURE-DEVELOPMENT [J].