MECHANICAL FAILURE OF ANODIC FILMS ON ALUMINUM AND TANTALUM

被引:18
作者
CHOO, YH
DEVEREUX, OF
机构
[1] UNIV CONNECTICUT, DEPT MET, STORRS, CT 06268 USA
[2] UNIV CONNECTICUT, INST MAT SCI, STORRS, CT 06268 USA
关键词
D O I
10.1149/1.2132714
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
引用
收藏
页码:1868 / 1876
页数:9
相关论文
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