ION-BOMBARDMENT EFFECT ON THE GROWTH OF A-SI-H FILMS DEPOSITED FROM A PURE SILANE PLASMA

被引：15

作者：

DREVILLON, B

HUC, J

BOUSSARSSAR, N

机构：

来源：

JOURNAL OF NON-CRYSTALLINE SOLIDS | 1983年 / 59-6卷 / DEC期

关键词：

D O I：

10.1016/0022-3093(83)90276-4

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：735 / 738

页数：4

共 8 条

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[7]

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[8] PROTON-MAGNETIC-RESONANCE STUDIES OF MICROSTRUCTURE IN PLASMA-DEPOSITED AMORPHOUS-SILICON-HYDROGEN FILMS [J].

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PHYSICAL REVIEW B, 1981, 24 (06) :3360-3370

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