LASER INTERFEROMETRY OF ELECTROLESS DEPOSITION OF COPPER SELENIDE

被引：14

作者：

OBRIEN, RN ^{[1
]}

SANTHANAM, KSV ^{[1
]}

机构：

[1] TATA INST FUNDAMENTAL RES,CHEM PHYS GRP,BOMBAY 400005,INDIA

来源：

JOURNAL OF ELECTROANALYTICAL CHEMISTRY | 1989年 / 260卷 / 01期

关键词：

D O I：

10.1016/0022-0728(89)87115-3

中图分类号：

O65 [分析化学];

学科分类号：

070302 ; 081704 ;

摘要：

引用

页码：231 / 235

页数：5

共 24 条

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