HIGH FLATNESS MASK FOR STEP AND REPEAT X-RAY-LITHOGRAPHY

被引：7

作者：

SUZUKI, K

MATSUI, J

机构：

[1] NEC Corp, Kawasaki, Jpn, NEC Corp, Kawasaki, Jpn

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1986年 / 4卷 / 01期

关键词：

D O I：

10.1116/1.583443

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：221 / 225

页数：5

共 10 条

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[10]

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