EFFECT OF RADIAL GROWTH-RATE VARIATION ON RESONANT TUNNELING DIODE CURRENT-VOLTAGE CHARACTERISTICS

The uniformity of electronic device characteristics is dependent on the uniformity of the epitaxial material. Uniformity is particularly important for resonant tunneling diodes where small changes in well or barrier thickness can have profound effects on the diode current-voltage characteristics. The variability of these characteristics due to growth rate nonuniformity for epitaxial structures grown by molecular beam epitaxy has been documented and the magnitude of the thickness variations analyzed using photoluminescence and a theoretical model. An increase of 17 meV was observed in the quantum well ground state, corresponding to a 15% thinning of the well from the center to the edge of the substrate.