SUSTAINER ENHANCEMENT OF VUV FLUORESCENCE IN HIGH-PRESSURE XENON

被引：5

作者：

HUBER, EE

JONES, LR

GEORGE, EV

LERNER, RM

机构：

[1] MIT LINCOLN LAB,LEXINGTON,MA 02173

[2] MIT,ELECTR RES INST,CAMBRIDGE,MA 02139

来源：

IEEE JOURNAL OF QUANTUM ELECTRONICS | 1976年 / 12卷 / 06期

关键词：

D O I：

10.1109/JQE.1976.1069161

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：353 / 359

页数：7

共 13 条

[1] ENERGY DEPOSITION OF ELECTRONS IN GAS-LASERS [J].

BASS, JN ;

GREEN, AES .

JOURNAL OF APPLIED PHYSICS, 1973, 44 (08) :3726-3728

[2]

COHEN RA, 1973, MIT197338 LINC LAB T

[3] HIGH-PRESSURE XENON LASER AT 1730-A [J].

GERARDO, JB ;

JOHNSON, AW .

IEEE JOURNAL OF QUANTUM ELECTRONICS, 1973, QE 9 (07) :748-755

[4]

GRUN AE, 1957, Z NATURFORSCH PT A, V12, P89

[5] OBSERVATIONS OF STIMULATED EMISSION FROM HIGH-PRESSURE KRYPTON AND ARGON-XENON MIXTURES [J].

HOFF, PW ;

SWINGLE, JC ;

RHODES, CK .

APPLIED PHYSICS LETTERS, 1973, 23 (05) :245-246

[6] 126.1-NM MOLECULAR ARGON LASER [J].

HUGHES, WM ;

SHANNON, J ;

HUNTER, R .

APPLIED PHYSICS LETTERS, 1974, 24 (10) :488-490

[7] DILUENT COOLING OF A VACUUM ULTRAVIOLET HIGH-PRESSURE XENON LASER [J].

JOHNSON, AW ;

GERARDO, JB .

JOURNAL OF APPLIED PHYSICS, 1974, 45 (02) :867-872

[8] STIMULATED VUV EMISSION IN HIGH-PRESSURE XENON EXCITED BY HIGH-CURRENT RELATIVISTIC ELECTRON-BEAMS [J].

KOEHLER, HA ;

REDHEAD, DL ;

FERDERBER, LJ ;

EBERT, PJ .

APPLIED PHYSICS LETTERS, 1972, 21 (05) :198-+

[9] REVIEW OF ULTRAVIOLET LASER PHYSICS [J].

RHODES, CK .

IEEE JOURNAL OF QUANTUM ELECTRONICS, 1974, QE10 (02) :153-174

[10]

RHODES CK, 1973, LASER SPECTROSCOPY, P113

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