STUDIES OF THE OPTICAL-EMISSION FROM A HYDROGEN HYDROCARBON RF PLASMA-JET STREAM DURING DIAMOND FILM DEPOSITION

被引：11

作者：

BARANKOVA, H ^{[1
]}

BARDOS, L ^{[1
]}

BERG, S ^{[1
]}

机构：

[1] UNIV UPPSALA,INST TECHNOL,DEPT ELECTR,S-75121 UPPSALA,SWEDEN

来源：

关键词：

D O I：

10.1016/0925-9635(93)90080-L

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

We present the results of optical emission spectroscopy from the plasma channel in an r.f. plasma jet system during deposition of diamond and glassy carbon films. Optical emission spectra were investigated for different deposition parameters. The influence of the gas pressure, r.f. power, ratio of the gas flow rates and the substrate were studied and related to the properties of the deposited films. Radial profiles of CH, CH+ and C2 band intensities and hydrogen (H(beta) and H(gamma)) line intensities were correlated to the corresponding radial distribution of diamond content in the deposited films. Diamond growth takes place when the CH-to-H(gamma) ratio is less than 4. The results indicate that the diamond film growth was accompanied by the presence of CH+ ion emission. The presence of C2 molecular emission, however, indicates the growth of non-diamond phases.

引用

页码：347 / 352

页数：6

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