ELECTRICAL-RESISTIVITY OF THIN BISMUTH-FILMS

被引:15
作者
BABA, S [1 ]
SUGAWARA, H [1 ]
KINBARA, A [1 ]
机构
[1] UNIV TOKYO,FAC ENGN,DEPT APPL PHYS,7-3-1 HONGO,BUNKYO 113,TOKYO,JAPAN
关键词
D O I
10.1016/0040-6090(76)90379-5
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
引用
收藏
页码:329 / 335
页数:7
相关论文
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