MINIMAL BEAM EXPOSURE WITH A FIELD-EMISSION SOURCE

被引：8

作者：

OHTSUKI, M ^{[1
]}

ZEITLER, E ^{[1
]}

机构：

[1] UNIV CHICAGO,CHICAGO,IL 60637

来源：

ULTRAMICROSCOPY | 1975年 / 1卷 / 02期

关键词：

D O I：

10.1016/S0304-3991(75)80021-0

中图分类号：

TH742 [显微镜];

学科分类号：

摘要：

引用

收藏

页码：163 / 165

页数：3

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