THIN-FILM EVALUATION TECHNIQUES FOR ESFI SOS TECHNOLOGY

被引:2
作者
DRUMINSKI, M [1 ]
KUHL, C [1 ]
PREUSS, E [1 ]
SCHWIDEFSKY, F [1 ]
SPLITTGERBER, H [1 ]
TAKACS, D [1 ]
机构
[1] SIEMENS AG,RES LAB,D-8000 MUNICH 80,FED REP GER
关键词
D O I
10.7567/JJAPS.15S1.217
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:217 / 220
页数:4
相关论文
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[2]   ION CHANNELING STUDIES OF CRYSTALLINE PERFECTION OF EPITAXIAL LAYERS [J].
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[3]  
RAETZEL C, 1972, SIEMENS FORSCH ENTW, V1, P307
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