SOLUTION PHOTOCHEMISTRY OF POLY(DIALKYLSILANES) - A NEW CLASS OF PHOTORESISTS

被引：83

作者：

MICHL, J ^{[1
]}

DOWNING, JW ^{[1
]}

KARATSU, T ^{[1
]}

MCKINLEY, AJ ^{[1
]}

POGGI, G ^{[1
]}

WALLRAFF, GM ^{[1
]}

SOORIYAKUMARAN, R ^{[1
]}

MILLER, RD ^{[1
]}

机构：

[1] IBM CORP,RES LABS,ALMADEN RES CTR,SAN JOSE,CA 95120

来源：

PURE AND APPLIED CHEMISTRY | 1988年 / 60卷 / 07期

关键词：

D O I：

10.1351/pac198860070959

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

引用

收藏

页码：959 / 972

页数：14

相关论文

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