200-KEV HE+-ION IRRADIATION EFFECTS ON THE PROPERTIES OF PULSED-LASER-DEPOSITED YBA2CU3O7-X THIN-FILMS

被引：16

作者：

VADLAMANNATI, S ^{[1
]}

ENGLAND, P ^{[1
]}

STOFFEL, NG ^{[1
]}

FINDIKOGLU, A ^{[1
]}

LI, Q ^{[1
]}

VENKATESAN, T ^{[1
]}

MCLEAN, WL ^{[1
]}

机构：

[1] BELLCORE,RED BANK,NJ 07701

来源：

PHYSICAL REVIEW B | 1991年 / 43卷 / 07期

关键词：

D O I：

10.1103/PhysRevB.43.5290

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

We report the effects of 200-keV He+ -ion irradiation on the properties of high-quality YBa2Cu3O7-x thin films made in situ by pulsed-laser deposition. There is no significant change in T(c) or the normal-state resistivity for fluences up to 1 x 10(14) He+/cm2. There is only a small increase in the critical current density J(c) measured at 60 K for fluences up to 3 x 10(13) He+/cm2 and in nonzero magnetic fields. At fluences above 1 x 10(14) He+/cm2, the induced changes are more rapid and have a deleterious effect on the superconducting properties.

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页码：5290 / 5295

页数：6

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