STRUCTURAL PERFECTION IN PHYSISORBED FILMS - A SYNCHROTRON X-RAY-DIFFRACTION STUDY OF XENON ADSORBED ON THE AG(111) SURFACE

被引:21
作者
DAI, P [1 ]
ANGOT, T [1 ]
EHRLICH, SN [1 ]
WANG, SK [1 ]
TAUB, H [1 ]
机构
[1] PURDUE UNIV,SCH MAT ENGN,W LAFAYETTE,IN 47907
关键词
D O I
10.1103/PhysRevLett.72.685
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
Synchrotron x-ray scattering has been used to investigate the structure and growth of xenon films physisorbed on the Ag(111) surface. For growth under quasiequilibrium conditions, the bulk Xe-Xe spacing is reached;at monolayer completion and fcc films of thickness greater-than-or-equal-to 220 angstrom are observed. Under kinetic growth conditions, intensity oscillations in the specular reflectivity as a function of time demonstrate nearly layer-by-layer growth. Modeling of the intensity at a fixed coverage allows profiling of the Xe/vacuum interface as well as a direct determination of the film's thickness and layer spacings.
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页码:685 / 688
页数:4
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