STRESS PLATE OPTICAL MODULATOR FOR CIRCULAR DICHROISM MEASUREMENTS

被引：72

作者：

MOLLENAUER, LF

DOWNIE, D

ENGSTROM, H

GRANT, WB

机构：

[1] Physics Department, Berkeley, CA

[2] University of California, Berkeley, CA

来源：

APPLIED OPTICS | 1969年 / 8卷 / 03期

关键词：

D O I：

10.1364/AO.8.000661

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

The fused silica stress plate modulator described below offers several advantages over the other known electrooptic modulation devices: primarily, high transmission over a broad wavelength range, and large aperture. When operated at its electromechanical resonance frequency of 16.7 kHz, the modulator requires only low voltage, low power drive to operate as a ±λ/4 plate. Complete constructional details are given, including a model from which resonance frequencies may be calculated. As part of a circular dichroism apparatus, the modulator has allowed measurement of effects as small as 1 part in 105. The possibility of extension of the operating range into the vacuum uv is discussed. © 1969 Optical Society of America.

引用

页码：661 / +

页数：1

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