DISCUSSION ON LIMITATIONS OF INSITU DEFORMATION EXPERIMENTS IN A HIGH-VOLTAGE ELECTRON-MICROSCOPE

被引：25

作者：

MARTIN, JL

KUBIN, LP

机构：

来源：

关键词：

D O I：

10.1016/S0304-3991(78)80028-X

中图分类号：

TH742 [显微镜];

学科分类号：

摘要：

引用

页码：215 / 226

页数：12

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