SI-BASED PHASE ZONE PLATES FOR SOFT X-RADIATION

被引：2

作者：

DOROZHKINA, LV

PANCHENKO, LA

YUNKIN, VA

ERKO, AI

KHZMALIAN, ER

SAZONOVA, CD

REDKIN, SV

机构：

[1] Institute of Microelectronics Technology and High Purity Materials, USSR Academy of Sciences, 142432 Chernogolovka, Moscow District

来源：

OPTICS COMMUNICATIONS | 1990年 / 75卷 / 5-6期

关键词：

D O I：

10.1016/0030-4018(90)90198-3

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

Results are presented of experimental testing of the focusing properties of phase zone plates at 0.8 nm wavelength. Free-standing linear and circular Si zone plates were manufactured by electron beam lithography, ion-chemical and anisotropic chemical etching. The absolute focusing efficiency obtained was 18±2%. © 1990.

引用

页码：370 / 374

页数：5

共 7 条

[1]

BABIN SV, 1987, PRIB TEKH EXP SOL, V2, P191

[2]

DAVYDOV AV, 1987, PISMA ZH TEKH FIZ+, V13, P1017

[3]

Henke B. L., 1981, AIP C P, V75, P340

[4]

HIKENBACK R, 1986, SPIE P, V733, P464

[5] QUANTITATIVE IMAGING AND MICROANALYSIS WITH A SCANNING SOFT-X-RAY MICROSCOPE [J].

JACOBSEN, C ;

KENNEY, JM ;

KIRZ, J ;

ROSSER, RJ ;

CINOTTI, F ;

RARBACK, H ;

PINE, J .

PHYSICS IN MEDICINE AND BIOLOGY, 1987, 32 (04) :431-437

[6] PHASE ZONE PLATES FOR X-RAYS AND EXTREME UV [J].

KIRZ, J .

JOURNAL OF THE OPTICAL SOCIETY OF AMERICA, 1974, 64 (03) :301-309

[7]

RUDOLPH D, 1988, TOCHIGI M XRAY MICRO, P11

← 1 →