SHORT-PULSE EXCITATION OF A XENON MOLECULAR DISSOCIATION LASER AT 172.9 NM BY RELATIVISTIC ELECTRONS

被引:17
作者
WALLACE, SC [1 ]
HODGSON, RT [1 ]
DREYFUS, RW [1 ]
机构
[1] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
关键词
D O I
10.1063/1.1654786
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:672 / 674
页数:3
相关论文
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