QUANTITATIVE ELECTRON-PROBE MICROANALYSIS OF NOBLE-GASES IN SPUTTERED LAYERS OF SEMICONDUCTORS

被引:3
作者
KUCHLER, L
HUNGER, HJ
机构
[1] Sektion Chemie Und Werkstofftechnik, Technischen Hochschule, Karl-Marx-Stadt
来源
PHYSICA STATUS SOLIDI A-APPLIED RESEARCH | 1979年 / 54卷 / 02期
关键词
D O I
10.1002/pssa.2210540258
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
[No abstract available]
引用
收藏
页码:K141 / K144
页数:4
相关论文
共 5 条
[1]  
CASTAING R, 1960, ADV ELECTRONICS ELEC, V13, P353
[2]   EFFICIENCY OF PRODUCTION OF CHARACTERISTIC X-RADIATION IN THICK TARGETS OF A PURE ELEMENT [J].
GREEN, M ;
COSSLETT, VE .
PROCEEDINGS OF THE PHYSICAL SOCIETY OF LONDON, 1961, 78 (505) :1206-&
[3]  
HUNGER HJ, 1978, 4TH C MIKR DRESD, P22
[4]  
RUDOLPH W, COMMUNICATION
[5]  
SAPRIKIN LI, COMMUNICATION