NOISE OF FIELD-EFFECT TRANSISTORS AT VERY HIGH FREQUENCIES

被引:11
作者
KLAASSEN, FM
PRINS, J
机构
[1] Philips' Research Laboratories, N. V. Philips' Gloeilampenfabrieken, Eindhoven
关键词
D O I
10.1109/T-ED.1969.16886
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The minimum noise factor of a field-effect transistor has been computed at high frequencies on the basis of the thermal noise of the real parts of the equivalent circuit. A treatment of the intrinsic FET is followed by a consideration of the influence of feed-back, parasitic output impedance and parasitic impedance in series with the source on the noise factor. Moreover, the difference between common-gate and common-source configuration has been considered. For frequencies smaller than the gain-bandwidth product fgb the factor Fnin -1 varies linearly with the frequency, whereas at higher frequencies this factor varies with f2. The computed results are compared with measurements on both JFETs and MOSFETs in the frequency range 100–1500 MHz at different conditions of operation The agreement is rather good. For the JFET the value of Fmin(fgb) ≈2.5; for the MOSFET somewhat higher values are found due to the presence of substrate depletion effects. Copyright © 1969 by The Institute of Electrical and Electronics Engineers, Inc.
引用
收藏
页码:952 / &
相关论文
共 13 条
  • [1] BAELDE A, 1965, PHILIPS RES REPTS S
  • [2] Becking A. G. T., 1955, PHILIPS RES REP, V10, P349
  • [3] BRUNCKE WC, 1966, IEEE T ELECTRON DEVI, VED13, P323
  • [4] HIGH-FREQUENCY MEASUREMENTS OF THIN-FILM TRANSISTORS
    DEGRAAFF, HC
    [J]. SOLID-STATE ELECTRONICS, 1967, 10 (01) : 51 - &
  • [5] HART PAH, 1961, PHILIPS RES REP, V16, P237
  • [6] KLAASSEN FM, 1967, PHILIPS RES REP, V22, P505
  • [7] KLAASSEN FM, TO BE PUBLISHED
  • [8] KLAASSEN FM, 1967, IEEE T ELECTRON DEVI, VED14, P368
  • [9] PAUL R, 1967, NACHRICHTEN TECHNIK, V12, P458
  • [10] SAH CT, 1966, IEEE DEVICE, VED13, P410