GROWTH AND ELECTRONIC-STRUCTURE OF NB AND TA FILMS ON PD AND THEIR INTERACTION WITH CO

被引:5
作者
JIANG, LQ
RUCKMAN, MW
STRONGIN, M
机构
[1] CUNY QUEENS COLL,FLUSHING,NY 11367
[2] BROOKHAVEN NATL LAB,DIV MAT SCI,UPTON,NY 11973
[3] BROOKHAVEN NATL LAB,DEPT APPL SCI,UPTON,NY 11973
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1989年 / 7卷 / 03期
关键词
D O I
10.1116/1.576005
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
引用
收藏
页码:2016 / 2019
页数:4
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