GROWTH AND ELECTRONIC-STRUCTURE OF NB AND TA FILMS ON PD AND THEIR INTERACTION WITH CO

被引：5

作者：

JIANG, LQ

RUCKMAN, MW

STRONGIN, M

机构：

[1] CUNY QUEENS COLL,FLUSHING,NY 11367

[2] BROOKHAVEN NATL LAB,DIV MAT SCI,UPTON,NY 11973

[3] BROOKHAVEN NATL LAB,DEPT APPL SCI,UPTON,NY 11973

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1989年 / 7卷 / 03期

关键词：

D O I：

10.1116/1.576005

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：2016 / 2019

页数：4

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