PHOTOOXIDATIVE STABILITY OF ELECTRON-BEAM AND UV CURED ACRYLATED EPOXY AND URETHANE ACRYLATE RESIN FILMS

被引：22

作者：

ALLEN, NS ^{[1
]}

ROBINSON, PJ ^{[1
]}

WHITE, NJ ^{[1
]}

SWALES, DW ^{[1
]}

机构：

[1] LANKRO CHEM LTD,RES & DEV,MANCHESTER,ENGLAND

来源：

POLYMER DEGRADATION AND STABILITY | 1987年 / 19卷 / 02期

关键词：

D O I：

10.1016/0141-3910(87)90073-5

中图分类号：

O63 [高分子化学（高聚物）];

学科分类号：

070305 ; 080501 ; 081704 ;

摘要：

引用

页码：147 / 160

页数：14

共 8 条

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ALLEN, NS ;

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WHITE, NJ ;

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[2] SPECTROSCOPIC PROPERTIES AND PHOTOSENSITIVITY OF EPOXY-RESINS [J].

ALLEN, NS ;

BINKLEY, JP ;

PARSONS, BJ ;

PHILLIPS, GO ;

TENNENT, NH .

POLYMER PHOTOCHEMISTRY, 1982, 2 (02) :97-107

[3] PHOTO-OXIDATIVE STABILITY OF ELECTRON-BEAM AND UV-CURED SI-ACRYLATE AND TRIACRYLATE RESINS - INFLUENCE OF RESIN INITIATOR STRUCTURE [J].

ALLEN, NS ;

ROBINSON, PJ ;

WHITE, NJ ;

SKELHORNE, GG .

EUROPEAN POLYMER JOURNAL, 1984, 20 (01) :13-18

[4] PHOTOCHEMICAL REACTIONS IN AN MDI-BASED ELASTOMERIC POLYURETHANE [J].

ALLEN, NS ;

MCKELLAR, JF .

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[5]

GARDETTE JL, 1981, MAKROMOL CHEM, V182, P2723

[6] PRIMARY HYDROPEROXIDATION IN PHOTOOXIDATION OF POLYOLEFINS AND POLYAMIDES [J].

LEMAIRE, J ;

ARNAUD, R .

POLYMER PHOTOCHEMISTRY, 1984, 5 (1-6) :243-265

[7]

McKellar J.F., 1979, PHOTOCHEMISTRY MAN M, P216

[8]

OSAWA Z, DEV POLYM PHOTOCHEMI, V3, P209

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