EFFECTS OF PREREDUCTION AT MODERATE TEMPERATURES ON RH/CEO2 ON THE INTERACTIONS OF D-2, H-2 AND CO WITH RH/CEO2

被引:40
作者
CUNNINGHAM, J
CULLINANE, D
SANZ, J
ROJO, JM
SORIA, XA
FIERRO, JLG
机构
[1] CSIC, INST CIENCIA MAT, E-2806 MADRID, SPAIN
[2] INST CATALISIS & PETROLEOQUIM, E-28049 MADRID, SPAIN
来源
JOURNAL OF THE CHEMICAL SOCIETY-FARADAY TRANSACTIONS | 1992年 / 88卷 / 21期
关键词
D O I
10.1039/ft9928803233
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Temperature regimes for the uptake of hydrogen by reaction with various surface species on Rh/CeO2 catalysts obtained from an RhCl3 precursor are identified by temperature-programmed reduction (TPR). Evidence is obtained from TPD for the presence of hydrogen having different energies of desorption from Rh/CeO2 after prereductions at 373 and 653 K [low-temperature reduction (LTR) and moderate-temperature reduction (MTR), respectively]. H-1 NMR and H-D isotope exchange studies at room temperature are used to gain insights into the nature and relative amounts of 'weakly' and 'strongly' chemisorbed forms of hydrogen (H-1 and D2) detectable at Rh/CeO2 surfaces. After prereduction at various temperatures over LTR Rh/CeO2, a weakly chemisorbed form, associated with metallic rhodium surfaces, is observed to promote H-D isotope exchange with D2 at 295 K. However, such exchange is strongly inhibited by prior outgassing at 473 K or by reduction of Rh/CeO2 at temperatures in the range 473-653 K (MTR). Conversely, the latter prereductions are shown by TPD studies to enhance greatly the amount of hydrogen strongly chemisorbed by the CeO2 support. Evidence for MTR-induced inhibition of access to metallic rhodium surfaces also emerges from studies using carbon monoxide to probe the accessibility of various rhodium sites. However, 'direct' blockage of rhodium surface sites by hydrogen species strongly chemisorbed thereon is considered to be less probable than 'indirect' inhibitions arising initially from electronic effects associated with MTR-induced formation of oxygen vacancies and surface hydrides located at Rh/ceria microinterfaces. Together these eventually progress to decoration/encapsulation of the rhodium particles.
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页码:3233 / 3240
页数:8
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