EXCIMER-LASER ASSISTED CHEMICAL MACHINING OF SIC CERAMIC

被引：20

作者：

HIBI, Y ^{[1
]}

ENOMOTO, Y ^{[1
]}

KIKUCHI, K ^{[1
]}

SHIKATA, N ^{[1
]}

OGISO, H ^{[1
]}

机构：

[1] NATL ADV INTERDISCIPLINARY RES,TSUKUBA,IBARAKI 305,JAPAN

来源：

APPLIED PHYSICS LETTERS | 1995年 / 66卷 / 07期

关键词：

D O I：

10.1063/1.113431

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

A highly effective method of machining ceramic has been newly developed using a krypton fluoride (KrF) excimer laser with a 248 nm wavelength. The laser was irradiated on SiC in water to form a soft hydrous oxide layer by photochemical reaction. The softened layer was then cut with a diamond tool to form a mirror surface finish. The optimum conditions were found for both high machining rate and better surface integrity of SiC.© 1995 American Institute of Physics.

引用

页码：817 / 818

页数：2