HIGH-RATE DEPOSITION OF MAGNETIC-FILMS BY SPUTTERING FROM 2 FACING TARGETS

被引：13

作者：

NAOE, M

HOSHI, Y

YAMANAKA, S

机构：

来源：

关键词：

D O I：

10.1016/0022-0248(78)90464-5

中图分类号：

O7 [晶体学];

学科分类号：

0702 ; 070205 ; 0703 ; 080501 ;

摘要：

引用

页码：361 / 364

页数：4

共 8 条

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[2]

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[3]

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[4] USE OF RING GAP DISCHARGES FOR HIGH-RATE VACUUM COATING [J].

SCHILLER, S ;

HEISIG, U ;

GOEDICKE, K .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1977, 14 (03) :815-818

[5]

TSUKADA T, 1976, CPM7659 TECHN GROUP

WILSON, RW ;

TERRY, LE .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1976, 13 (01) :157-164

[7]

YAMANAKA S, 1977, T I ELECTRON COMMU C, V60, P399

[8]

YAMANAKA S, 1975, T I ELECT COMMUN ENG, V58, P597