AN ADVANCED X-RAY STEPPER FOR 1/5-MU-M SR LITHOGRAPHY

被引：15

作者：

ISHIHARA, S

SUZUKI, M

KANAI, M

FUKUDA, M

机构：

[1] NTT LSI Laboratories 3-1, Atsugi, Kanagawa, 243-01, Morinosato-Wakamiya

来源：

MICROELECTRONIC ENGINEERING | 1992年 / 17卷 / 1-4期

关键词：

D O I：

10.1016/0167-9317(92)90028-P

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

For the establishment of an advanced synchrotron radiation lithography system, it is necessary to develop an x-ray stepper with highly accurate alignment capability. A new version of a vertical stepper called SS-1 has been developed using an air-lubricated xy-stage, an optical heterodyne detection system and a digital software servo alignment control system. It is shown in this paper that the stepper has the capability of achieving an alignment accuracy better than the 3-sigma value of 70 nm and delineating 0.2-mu-m line and space pattern clearly.

引用

页码：141 / 144

页数：4

共 5 条

[1]

Ishihara, Kanai, Une, Suzuki, A vertical stepper for synchrotron x-ray lithography, Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 7 B, 6, (1989)

[2]

Fukuda, Suzuki, Ishihara, Microelectronic Eng., 13, (1991)

[3]

Suzuki, Une, An optical-heterodyne alignment technique for quarter-micron x-ray lithography, Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 7 B, 6, (1989)

[4]

Hosokawa, Kitayama, Hayasaka, Ido, Une, Shibayama, Nakata, Nakajima, Rev. Sci. Instrum., 60, (1989)

[5]

Kaneko, Saito, Itabashi, Yoshihara, High efficiency beamline for synchrotron radiation lithography, Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 9 B, 6, (1991)

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