THE ROLE OF CH4 IN METAL ORGANIC-CHEMICAL VAPOR-DEPOSITION OF GAAS

被引：12

作者：

ARENS, G

LUTH, H

HEYEN, M

BALK, P

机构：

[1] RHEIN WESTFAL TH AACHEN,INST PHYS 2,SONDERSFORSCH BERICH 202,D-5100 AACHEN,FED REP GER

[2] RHEIN WESTFAL TH AACHEN,INST SEMICOND ELECTR,D-5100 AACHEN,FED REP GER

来源：

THIN SOLID FILMS | 1986年 / 136卷 / 02期

关键词：

D O I：

10.1016/0040-6090(86)90287-7

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

16

引用

收藏

页码：281 / 287

页数：7

相关论文

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