NOVEL CONTACTLESS ELECTROREFLECTANCE SPECTROSCOPY OF SEMICONDUCTORS

被引:28
作者
GAL, M
SHWE, C
机构
[1] School of Physics, University of New South Wales, Kensington, NSW 2033
关键词
D O I
10.1063/1.102740
中图分类号
O59 [应用物理学];
学科分类号
摘要
Optical reflectance difference technique has been applied to semiconductors. It has been demonstrated that differential reflectance spectroscopy (DR) can be equivalent to contactless electromodulation. The measured DR spectra of GaAs are comparable to the published electroreflectance data and show marked improvement in the signal-to-noise ratio over the photoreflectance spectra of the same samples. We have used this method to study the confined energy levels in InGaAs/GaAs multiple quantum wells and have found good agreement with the theoretically predicted values. We conclude that DR is a viable alternative to photoreflectance as a contactless electromodulation technique.
引用
收藏
页码:545 / 547
页数:3
相关论文
共 17 条
[1]   THIRD-DERIVATIVE MODULATION SPECTROSCOPY WITH LOW-FIELD ELECTROREFLECTANCE [J].
ASPNES, DE .
SURFACE SCIENCE, 1973, 37 (01) :418-442
[2]  
Cardona M., 1969, MODULATION SPECTROSC
[3]  
DAVISON SG, 1970, SOLID STATE PHYS, V25, P1
[4]   OBSERVATION OF COMPRESSIVE AND TENSILE STRAINS IN INGAAS GAAS BY PHOTOLUMINESCENCE SPECTROSCOPY [J].
GAL, M ;
ORDERS, PJ ;
USHER, BF ;
JOYCE, MJ ;
TANN, J .
APPLIED PHYSICS LETTERS, 1988, 53 (02) :113-115
[5]  
GLEMBOCKI OJ, 1985, P SOC PHOTO-OPT INST, V524, P86, DOI 10.1117/12.946323
[6]   DIFFERENTIAL-REFLECTOMETER FOR MEASUREMENTS OF SMALL DIFFERENCES IN REFLECTIVITY [J].
HOLBROOK, JA ;
HUMMEL, RE .
REVIEW OF SCIENTIFIC INSTRUMENTS, 1973, 44 (04) :463-466
[7]   OPTICAL REFLECTIVITY MEASUREMENTS ON ALLOYS BY COMPOSITIONAL MODULATION [J].
HUMMEL, RE ;
DOVE, DB ;
HOLBROOK, JA .
PHYSICAL REVIEW LETTERS, 1970, 25 (05) :290-&
[8]   DIFFERENTIAL REFLECTOMETRY AND ITS APPLICATION TO THE STUDY OF ALLOYS, ORDERING, CORROSION, AND SURFACE-PROPERTIES [J].
HUMMEL, RE .
PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 1983, 76 (01) :11-44
[9]   OPTICAL INVESTIGATIONS OF ION IMPLANT DAMAGE IN SILICON [J].
HUMMEL, RE ;
XI, W ;
HOLLOWAY, PH ;
JONES, KA .
JOURNAL OF APPLIED PHYSICS, 1988, 63 (08) :2591-2594
[10]   OPTICAL-TRANSITIONS INVOLVING UNCONFINED ENERGY-STATES IN INXGA1-X AS/GAAS MULTIPLE QUANTUM WELLS [J].
JI, G ;
DOBBELAERE, W ;
HUANG, D ;
MORKOC, H .
PHYSICAL REVIEW B, 1989, 39 (05) :3216-3222