COADSORPTION OF K AND O2 ON MOS2(0001)

被引：16

作者：

PAPAGEORGOPOULOS, C

KAMARATOS, M

KENNOU, S

VLACHOS, D

机构：

[1] Department of Physics, University of Ioannina, GR-45110 Ioannina

来源：

SURFACE SCIENCE | 1992年 / 277卷 / 03期

关键词：

D O I：

10.1016/0039-6028(92)90768-2

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

The coadsorption of K and O2 on MoS2(0001) at RT, has been investigated by LEED, AES, TDS and WF measurements. The sticking coefficient and the maximum amount of oxygen on the surface increase with K coverage. For theta(K) > 0.5 the amount of desorbed oxygen increases almost linearly with theta(K). The oxygen interacts strongly with K and forms K-O complexes on the surface of MoS2. The TD spectra show K2O2, K2O and KO2. The interaction of the adsorbed oxygen with K causes the diffusion of intercalated K to the surface (deintercalation). The deintercalation of K to the surface helps estimating the coverage of K on MoS2.

引用

页码：273 / 281

页数：9

共 27 条

[1] MECHANISM OF ALKALI-PROMOTED OXIDATION OF SILICON [J].