PRACTICAL CONSIDERATIONS IN X-RAY MASK MOUNTING METHODOLOGY

被引：17

作者：

LAIRD, DL

LAUDON, MF

ENGELSTAD, RL

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1993年 / 11卷 / 06期

关键词：

D O I：

10.1116/1.586567

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Overlay requirements for 1:1 masks used in x-ray lithography require robust mask mounting techniques which are relatively insensitive to uncontrollable imperfections. Small variations in mask flatness or mounting surface flatness should not make the mask unusable. The cases of 3-2-1 pinch-type kinematic mounts, stiff vacuum pad mounts, and full surface mounts are investigated here. The results show the kinematic mount to be superior in its insensitivity to the original equilibrium configuration of the mass after bonding.

引用

页码：2953 / 2957

页数：5

共 12 条

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