GROWTH KINETICS OBSERVED IN FORMATION OF METAL SILICIDES ON SILICON

[1] BOWER RW, UNPUBLISHED

[2] GROVE AS, 1967, PHYS TECHNOL S, pCH2

[3] LOW-TEMPERATURE MIGRATION OF SILICON IN THIN LAYERS OF GOLD AND PLATINUM [J]. APPLIED PHYSICS LETTERS, 1971, 18 (05) : 178 - &

[4] KRICHER CJ, 1971, SOLID STATE ELECTRON, V14, P507

[5] Lepselter M. P., 1969, Ohmic contacts to semiconductors, P159

[6] CHANNELING-EFFECT ANALYSIS OF THIN FILMS ON SILICON - ALUMINUM OXIDE [J]. JOURNAL OF APPLIED PHYSICS, 1971, 42 (11) : 4378 - +

[7] MUTA H, TO BE PUBLISHED

[8] RUSCH MVT, 1968, SOLID STATE ELECTRON, V11, P517

[9] WALKER GA, 1970, J VAC SCI TECHNOL, V7, P543, DOI [10.1116/1.1315872, 10.1116/1.1315878]

[1] BOWER RW, UNPUBLISHED

[2] GROVE AS, 1967, PHYS TECHNOL S, pCH2

[3] LOW-TEMPERATURE MIGRATION OF SILICON IN THIN LAYERS OF GOLD AND PLATINUM [J]. APPLIED PHYSICS LETTERS, 1971, 18 (05) : 178 - &

[4] KRICHER CJ, 1971, SOLID STATE ELECTRON, V14, P507

[5] Lepselter M. P., 1969, Ohmic contacts to semiconductors, P159

[6] CHANNELING-EFFECT ANALYSIS OF THIN FILMS ON SILICON - ALUMINUM OXIDE [J]. JOURNAL OF APPLIED PHYSICS, 1971, 42 (11) : 4378 - +

[7] MUTA H, TO BE PUBLISHED

[8] RUSCH MVT, 1968, SOLID STATE ELECTRON, V11, P517

[9] WALKER GA, 1970, J VAC SCI TECHNOL, V7, P543, DOI [10.1116/1.1315872, 10.1116/1.1315878]