DIFFUSION-COEFFICIENT AND ELECTROMIGRATION VELOCITY OF COPPER IN THIN SILVER FILMS

被引：22

作者：

DIGIACOM.G ^{[1
]}

PERESSIN.P ^{[1
]}

RUTLEDGE, R ^{[1
]}

机构：

[1] IBM CORP, SYST PROD DIV, E FISHKILL FACILITY, Hopewell Jct, NY 12533 USA

来源：

关键词：

D O I：

10.1063/1.1663466

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1626 / 1629

页数：4

共 7 条

BLACK, JR .

[2]

Boltaks B.I., 1963, DIFFUSION SEMICONDUC

[3] CURRENT-INDUCED MARKER MOTION IN COPPER [J].

GRONE, AR .

[4]

HALL MG, 1969, T METALL SOC AIME, V245, P2476

[5] ELECTROMIGRATION AND VOID OBSERVATION IN SILVER [J].

HO, PS ;

HUNTINGT.HB .

[6] CURRENT-INDUCED MARKER MOTION IN GOLD WIRES [J].

HUNTINGTON, HB ;

GRONE, AR .

[7]

NANDA M, PRIVATE COMMUNICATIO