CHEMICAL VAPOR-DEPOSITION OF BORON SUBARSENIDE USING HALIDE REACTANTS

被引:8
作者
CORREIA, LA
VANOORT, RC
VANDERPUT, PJ
机构
[1] Delft Univ of Technology, Delft, Neth, Delft Univ of Technology, Delft, Neth
来源
REACTIVITY OF SOLIDS | 1986年 / 2卷 / 03期
关键词
FILMS; -; Preparation; SPECTROSCOPY;
D O I
10.1016/0168-7336(86)80083-3
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Conditions for the chemical vapour deposition of amorphous and crystalline boron subarsenide using halide reactants have been determined. With increasing deposition temperature the arsenic content of the boron subarsenide decreases, as established by X-ray photoelectron spectroscopy.
引用
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页码:203 / 213
页数:11
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