INTENSITY DEPENDENCE OF PHOTOLUMINESCENCE IN GAN THIN-FILMS

We report the intensity dependence of band-gap and midgap photoluminescence in GaN films grown by electron cyclotron resonance (ECR) microwave plasma-assisted molecular beam epitaxy. We find that the band-gap luminescence depends linearly while the midgap luminescence has a nonlinear dependence on the incident light intensity. These data were compared with a simple recombination model which assumes a density of recombination centers 2.2 eV below the conduction band edge. The concentration of these centers is higher in films grown at higher microwave power in the ECR plasma.