X-RAY SOURCES FOR MICROLITHOGRAPHY CREATED BY LASER-RADIATION AT LAMBDA= 0.26-MU

被引：23

作者：

PEPIN, H

ALATERRE, P

CHAKER, M

FABBRO, R

FARAL, B

TOUBHANS, I

NAGEL, DJ

PECKERAR, M

机构：

[1] ECOLE POLYTECH,LAB PMI,F-91128 PALAISEAU,FRANCE

[2] USN,RES LAB,WASHINGTON,DC 20375

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1987年 / 5卷 / 01期

关键词：

D O I：

10.1116/1.583883

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：27 / 32

页数：6

共 19 条

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[7] LASER IRRADIATION OF DISK TARGETS AT 0.53 MU-M WAVELENGTH [J].

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[8] ATOMIC-NUMBER DEPENDENCE OF SOFT-X-RAY EMISSION FROM VARIOUS TARGETS IRRADIATED BY A 0.53-MU-M-WAVELENGTH LASER [J].

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[9] SUBMICROSECOND X-RAY LITHOGRAPHY [J].

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[10] REPETITIVELY PULSED-PLASMA SOFT-X-RAY SOURCE [J].

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